China startup demoes prototype EUV light source
Chinese startup Langdao Silex showcased its laser-produced plasma EUV source at a trade show, but the technology will likely take many years before it gets to decent EUV power levels. Even if it does, China will need many more advancements to build a practical EUV lithography tool.
Chinese startup Langdao Silex showcased a prototype EUV light source at the China International Industry Fair, boasting a power output of over 15W, 90% domestic components, and high uptime. Established in 2024 by alumni of Tsinghua University's Gas Discharge Plasma Laboratory, the startup aims to commercialize its technology within three to five years.
The company's low-power FlintNano LPP-OXXO system utilizes laser-produced plasma to generate EUV radiation, achieving an efficiency of over 2%. Despite its current output being insufficient for high-volume chip production, the system demonstrates promising uptime and stability, making it suitable for semiconductor exposure experiments.
Langdao is also developing a more powerful FlintMicro-LPP high-power EUV source, though specific performance metrics remain undisclosed. While the startup's EUV source is comparable to early EUV systems developed by Western and Japanese equipment makers, direct comparisons are challenging due to differing measurement conditions and operational durations.
However, Langdao Silex's progress in developing a domestic EUV light source could support various research and development activities in EUV technology, but it is unlikely to lead to the immediate manufacturing of EUV lithography machines in China.
Written by urgent.news from Tom's Hardware's reporting — not their text. Machine-written — may contain errors; check the original before relying on it.
