Russian startup claims it could produce silicon wafers in five minutes instead of two weeks, but trillion-dollar IMEC doesn't have to worry
A Russian startup has tested a multicathode electron source promising faster wafer exposure, though its complete lithograph remains years away.
Russian startup claims to have developed a multicathode electron beam lithography system that could drastically reduce the time it takes to produce silicon wafers for microchips. The technology, which generates multiple electron beams simultaneously, could potentially cut exposure time from two weeks to just five minutes. However, the startup emphasizes that a complete lithography machine is still years away from being built, and a working prototype could take around three years to develop.
While the Russian development team sees promise in the technology, experts caution that there is still significant work to be done, and that rival technologies abroad could potentially advance further before any industrial-scale application emerges.
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