{
  "id": 6264806,
  "title": "Samsung and TSMC commit to using ASML's High NA EUV machines by 2028 and 2030, joining Intel, with all four agreeing to shift from 6-inch to 12-inch photomasks (Bloomberg)",
  "url": "https://urgent.news/2026/09/08/samsung-and-tsmc-commit-to-using-asmls-high-na-euv-machines-by-2028",
  "topic": "tech",
  "section": "Tech",
  "published": "2026-09-08T10:15:01.000Z",
  "source": {
    "name": "Techmeme",
    "slug": "techmeme",
    "url": "https://www.bloomberg.com/news/articles/2026-09-08/asml-tsmc-samsung-intel-back-12-inch-masks-for-ai-chips"
  },
  "original_language": "en",
  "account": null,
  "summary": "Samsung and TSMC have committed to using ASML's High NA EUV machines by 2028 and 2030, respectively. This move follows Intel's earlier adoption of the technology. According to The Korea Times, Samsung plans to introduce High NA EUV lithography into DRAM mass production by 2028.\n\nThe companies have also agreed to shift from 6-inch to 12-inch photomasks. Currently, Intel uses industry-standard 6-inch photomasks, but it is working on larger 6×12-inch photomasks.\n\nASML has won commitments from top chipmakers, including Samsung, TSMC, and Intel, to use its latest semiconductor production gear. The companies will work together to accelerate the development and deployment of technologies that support the increasing performance and efficiency requirements of advanced semiconductor manufacturing.",
  "key_points": [],
  "editors_take": null,
  "illustration": null,
  "coverage": {
    "outlets": 2,
    "also_reported_by": [
      {
        "outlet": "Tom's Hardware",
        "title": "Intel surpasses one million High-NA EUV wafers processed, outpaces the rest of the industry combined — company also trailblazing giant 6×12 photomasks to speed production and lower costs",
        "url": "https://urgent.news/2026/09/08/intel-surpasses-one-million-high-na-euv-wafers-processed-outpaces-the",
        "published": "2026-09-08T06:00:00.000Z"
      }
    ]
  },
  "ai_generated": true,
  "disclaimer": "Summaries, key points and the editor’s take are written by software from other outlets’ reporting and may contain errors — always check the linked original."
}