{
  "id": 3616675,
  "title": "Innovative etching method for silicon: Higher precision through interlayer",
  "url": "https://urgent.news/2026/08/26/innovative-etching-method-for-silicon-higher-precision-through",
  "topic": "science",
  "section": "Science",
  "published": "2026-08-26T23:20:01.000Z",
  "source": {
    "name": "Phys.org",
    "slug": "phys-org",
    "url": "https://phys.org/news/2026-08-etching-method-silicon-higher-precision.html"
  },
  "original_language": "en",
  "account": null,
  "summary": "In micro- and nanotechnology, highly precise components with tall, narrow structures (high aspect ratios) made from semiconductor materials like silicon are important. A promising fabrication method is gas-phase metal-assisted chemical etching (MacEtch). In this plasma-free process, a thin metal layer defines the pattern on the silicon substrate. The etching step takes place in a chemical…",
  "key_points": [],
  "editors_take": null,
  "illustration": null,
  "coverage": {
    "outlets": 1,
    "also_reported_by": []
  },
  "ai_generated": true,
  "disclaimer": "Summaries, key points and the editor’s take are written by software from other outlets’ reporting and may contain errors — always check the linked original."
}